Grogg, Daniel2005-11-022005-11-022005-11-022004https://infoscience.epfl.ch/handle/20.500.14299/218583Evaporation through shadow masks (nanostencils) overcomes the limitations typically given by patterning methods involving conventional optical lithography and etching, such as diffraction limits and etch-selectivity. This paper demonstrates the fabrication of metal cantilevers with sub-micron dimensions using direct evaporation through miniature nanostencils, followed by dry etching to release metal nanolevers from substrate.student work::semester or other student projects