Savu, V.Brugger, J.Kivioja, J.Ahopelto, J.2009-03-022009-03-022009-03-02200810.1109/TASC.2009.2019075https://infoscience.epfl.ch/handle/20.500.14299/35712WOS:000268282000028Shadow maskstencil lithographyStjsuperconducting tunnel junctionMasksQuick and Clean: Stencil Lithography for Wafer-Scale Fabrication of Superconducting Tunnel Junctionstext::conference output::conference proceedings::conference paper