Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography

Arcamone, JulienSansa, MarcVerd, JaumeUranga, ArantxaAbadal, GabrielBarniol, Nuriavan den Boogaart, MarcBrugger, JuergenPerez-Murano, Francesc2009-01-282009-01-28200910.1002/smll.200990007https://infoscience.epfl.ch/handle/20.500.14299/34460WOS:000263088700003mass sensorsnanoelectromechanical systemsnanolithographynanomechanical sensorsHigh-Frequency ApplicationsCmos-MemsDevicesNanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithographytext::journal::journal article::research article