Jiguet, SébastienBertsch, ArnaudJudelewicz, M.Hofmann, H.Renaud, Philippe2006-10-202006-10-20200610.1016/j.mee.2006.02.004https://infoscience.epfl.ch/handle/20.500.14299/235234WOS:0002389193000118904SU-8 nanocomposite photoresist with low stress properties for microfabrication applicationstext::journal::journal article::research article