Eswara, SanthanaPshenova, AlisaLentzen, EstherNogay, GizemLehmann, MarioIngenito, AndreaJeangros, QuentinHaug, Franz-JosefValle, NathaliePhilipp, PatrickHessler-Wyser, AichaWirtz, Tom2019-10-172019-10-172019-10-172019-09-0110.1557/mrc.2019.89https://infoscience.epfl.ch/handle/20.500.14299/162062WOS:000488237800015A method for rapid quantitative imaging of dopant distribution using secondary ion mass spectrometry (SIMS) is described. The method is based on SIMS imaging of the cross-section of a reference sample with a known concentration profile. It is demonstrated for the case of boron quantification in silicon in a SIMS imaging mode. A nonlinear relationship between the secondary ion intensity and the concentration is observed. A detection limit of 3 (+/- 2) x 10(17) at./cm(3) (similar to 6 ppm) is determined with 39 nm pixel-size for the used experimental conditions. As an application example, a boron concentration profile in a passivating contact deposited on a textured Si surface is analyzed.Materials Science, MultidisciplinaryMaterials Scienceelectron-microscopytemperatureA method for quantitative nanoscale imaging of dopant distributions using secondary ion mass spectrometry: an application example in silicon photovoltaicstext::journal::journal article::research article