Villanueva, G.Vazquez-Mena, O.Hibert, C.Brugger, J.2009-03-152009-03-152009-03-15200910.1109/MEMSYS.2009.4805339https://infoscience.epfl.ch/handle/20.500.14299/35993Direct Etching of High Aspect structures through a Stenciltext::conference output::conference proceedings::conference paper