Papageorgiou, Anthoula C.Diller, KatharinaFischer, SybilleAllegretti, FrancescoKlappenberger, FlorianOh, Seung CheolSaglam, OezgeReichert, JoachimWiengarten, AlissaSeufert, KnudAuwaerter, WilliBarth, Johannes V.2016-07-192016-07-192016-07-19201610.1021/acs.jpcc.6b01457https://infoscience.epfl.ch/handle/20.500.14299/127831WOS:000375521700035Porphyrin molecules offer a very stable molecular environment for the incorporation of numerous metal ions inside their cavity, which enables a plethora of applications. The fabrication and characterization of surface confined metal organic architectures by employing porphyrins are of particular interest. Here, we report on a comprehensive study of chemical vapor deposition (CVD) of triruthenium dodecacarbonyl as metal precursor for the on-surface metalation of different porphyrin species with Ru under ultrahigh vacuum conditions. By employing synchrotron radiation X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure (NEXAFS), and scanning tunneling microscopy (STM), we investigated the metalation process and particularly the role of the support: the close packed Ag(111) surface. It was found that the surface is active in the metalation process under the employed conditions: it decomposes the metal precursor and delivers metal centers to the porphyrin macrocycles. The generality of the metalation process is illustrated for tetraphenylporphyrin, its high temperature derivatives, and porphine.text::journal::journal article::research article