Hisatomi, TakashiLe Formal, FlorianCornuz, MaurinBrillet, JeremieTetreault, NicolasSivula, KevinGraetzel, Michael2012-01-132012-01-132012-01-13201110.1039/c1ee01194dhttps://infoscience.epfl.ch/handle/20.500.14299/76623The onset potential of photoelectrochemical water oxidation on ultrathin hematite was improved by up to 200 mV by the chemical bath deposition of 13-group oxides as overlayers. It is proposed that the corundum-type overlayers released lattice strain of the ultrathin hematite layer and decreased the density of surface states. Particularly, a Ga2O3 overlayer exhibited an enhanced photocurrent attributed to stoichiometric water splitting near the onset potential. The photocurrent was sustained over a day, attesting to its outstanding performance and durability for water splitting.Corundum-Type In2O3Nanostructured Alpha-Fe2O3Water PhotooxidationHydrogen-ProductionFilm ThicknessFeature SizeSemiconductorPhotoanodesElectrodesAlpha-Al2O3text::journal::journal article::research article