Liu, FengCharbon, Edoardo2025-01-252025-01-252025-01-252024-10-2110.1364/OE.5336312-s2.0-85207695443https://infoscience.epfl.ch/handle/20.500.14299/24419639573654We introduce the world’s first SPAD family design in 130 nm SiGe BiCMOS process. At 1.8 µm, we achieved the smallest pitch on record thanks to guard-ring sharing techniques, while keeping a relatively high fill factor of 24.2%. 4×4 SPAD arrays with two parallel selective readout circuits were designed to explore crosstalk and scalability. The SPAD family has a minimum breakdown voltage of 11 V, a maximum PDP of 40.6%, and a typical timing jitter of 47 ps FWHM. The development of silicon SPADs in SiGe process paves the way to Ge-on-Si SPADs for SWIR applications, and to cryogenic optical interfaces for quantum applications.entrue1.8-µm pitch, 47-ps jitter SPAD array in a 130 nm SiGe BiCMOS processtext::journal::journal article::research article