Klein, Mona Julia KatharinaGuillaumée, MickaëlWenger, BernardDunbar, AndreaBrugger, JürgenHeinzelmann, HarryPugin, Raphaël2010-07-132010-07-13201010.1088/0957-4484/21/20/205301https://infoscience.epfl.ch/handle/20.500.14299/51646WOS:000277214900006In this paper, a fast and inexpensive wafer-scale process for the fabrication of arrays of nanoscale holes in thin gold films for plasmonics is shown. The process combines nanosphere lithography using spin-coated polystyrene beads with a sputter-etching process. This allows the batch fabrication of several 1000 μm2 large hole arrays in 200 nm thick gold films without the use of an adhesion layer for the gold film. The hole size and lattice period can be tuned independently with this method. This allows tuning of the optical properties of the hole arrays for the desired application. An example application, refractive index sensing, is demonstrated.Subwavelength Hole ArraysOptical-TransmissionMetal-FilmsLithographyTransitionResonanceSizetext::journal::journal article::research article