Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

Rtimi, SamiPulgarin, CesarBaghriche, OualidKiwi, John2013-10-012013-10-012013-10-01201310.1039/c3ra41528ghttps://infoscience.epfl.ch/handle/20.500.14299/95904WOS:000322068400011Novel ultrathin TiO2-Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2-Cu-ions (M+) with the polyester surface due to the high fraction and density of M+-ions interacting with the biased substrate.Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor contenttext::journal::journal article::research article