Experimental study of the process dependence of Mo, Cr, Ti, and W silicon Schottky diodes and contact resistance

Moselund, K. E.Freiermuth, J. E.Dainesi, P.Ionescu, A. M.2007-05-162007-05-162007-05-16200610.1109/TED.2006.870574https://infoscience.epfl.ch/handle/20.500.14299/6990WOS:000236473500018Experimental study of the process dependence of Mo, Cr, Ti, and W silicon Schottky diodes and contact resistancetext::journal::journal article::research article