Cricenti, A.Longo, G.Mussi, V.Generosi, R.Luce, M.Perfetti, P.Vobornik, A.Margaritondo, G.Thielen, P.Sanghera, J. S.Aggarwal, I. D.Tolk, N. H.Baldacchini, G.Bonfigli, F.Flora, F.Marolo, T.Montereali, R. M.Faenov, A.Pikuz, T.Somma, F.Piston, D. W.2006-10-032006-10-032006-10-032003https://infoscience.epfl.ch/handle/20.500.14299/234893LiF films have been grown on silicon substrate, irradiated with soft x-rays to create fluorescent regular micrometric-spaced arrays based on colour centres, and studied by Scanning Near-field Optical Microscope (SNOM). Strong variations in the local reflectivity have been observed in the infrared region between 6.1 and 9.2 mum and tentatively ascribed to a modulated variation of the refractive index of the coloured zone with respect to that of the uncoloured LiF matrix. (C) 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.FIELD OPTICAL MICROSCOPEPLASMA SOURCELIF CRYSTALStext::book/monograph::book part or chapter