Fabrication of Nanochannels Using Photolithography and Partial Etching of Sacrificial Layer

Han, A.Mondin, G.Hegelbach, N. G.de Rooij, N. F.Staufer, U.2009-05-122009-05-122009-05-122004https://infoscience.epfl.ch/handle/20.500.14299/39375Fabrication of Nanochannels Using Photolithography and Partial Etching of Sacrificial Layertext::conference output::conference proceedings::conference paper