Perentes, A.Utke, I.Dwir, B.Leutenegger, M.Lasser, T.Hoffmann, P.Baida, F.Bernal, M. P.Russey, M.Salvi, J.Van Labeke, D.2006-10-032006-10-032006-10-03200510.1088/0957-4484/16/5/025https://infoscience.epfl.ch/handle/20.500.14299/234936WOS:0002295581000266976We report on the fabrication of two-dimensional arrays of nano-optical apertures in gold layers by electron beam lithography (EBL) on a transparent glass substrate. 30 x 30 μ m(2) large arrays of high aspect ratio sub-wavelength cylinders (400 nm diameter with period of 1.81 μ m) and annular apertures (diameters 250/330 nm and 3 10/330 nm inner/outer with period of 600 nm) were patterned in a 750 nm thick resist layer using a high contrast negative tone resist. The resist structures show sharp and vertical edges after development. The 150 nm thick deposited gold layer ensures optical transmission of less than 1.1 X 10(-4) at 633 nm wavelength. White light based optical characterizations agreed with theory predictions and prove the good quality of the structures.Light transmissiontext::journal::journal article::research article