Martin, C.Llobera, A.Leïchlé, T.Villanueva, G.Voigt, A.Fakhfouri, V.Kim, J. Y.Berthet, N.Bausells, J.Gruetzner, G.Nicu, L.Brugger, J.Perez-Murano, F.2008-06-252008-06-25200810.1016/j.mee.2008.01.052https://infoscience.epfl.ch/handle/20.500.14299/26382WOS:000257413400059We present two novel methods for the preparation of arbitrary microscale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.text::journal::journal article::research article