Matioli, Elison De NazarethVan Erp, Remco Franciscus Peter2021-07-052021-07-052021-07-052021https://infoscience.epfl.ch/handle/20.500.14299/179804The present invention relates to a method for fabricating an integrated electronic device with a microchannel, comprising the steps of: - Providing a homogeneous or heterogeneous substrate with one or more layers of material, respectively; - Forming at least one trench in the upper surface and through the upper layer using an etching process, particularly using a high aspect ratio etching process; - Sealing the trench by closing the opening of the trench on an upper surface of the upper layer.patentUS2023037442EP4078672WO202112156069056027