Briand, D.van der Wal, P. D.Mondin, G.Jenny, S.Jeanneret, S.Millon, C.Roussel, H.Dubourdieu, C.de Rooij, N. F.2009-05-122009-05-122009-05-122005https://infoscience.epfl.ch/handle/20.500.14299/39091Ta2O5 and HfO2 as ion-sensitive materials in ISFETstext::conference output::conference proceedings::conference paper