Baroni, P YPäivänranta, BScharf, TNakagawa, WRoussey, MKuittinen, MHerzig, H P2010-02-082010-02-082010-02-08201010.2971/jeos.2010.10006https://infoscience.epfl.ch/handle/20.500.14299/46499WOS:000274627800006A subwavelength-scale square lattice optical nanostructure is fabricated using an interference photolithography process on the surface of a quartz microlens array. This nanostructuring of the quartz surface introduces an antireflective effect, reducing reflectivity between 10% and 30% and enhancing the transmissivity 3% in the visible spectrum. This approach permits fast fabrication on a 4-inch wafer covered with microlenses (non-flat surface) and produces monolithic devices which are robust to adverse environments such as temperature variations. [DOI: 10.2971/jeos.2010.10006]antireflectivenanostructuremicrolensinterferencephotolithographytext::journal::journal article::research article