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Journal article

Desorption of ions during exposure of metallic and semiconductive samples to surface current pulses in vacuum

Effects of nanosecond electromagnetic pulses on metallic (Al) and semiconductor (Si, GaAs) surfaces were investigated exptl. in vacuum. For the surface c.d. 104-106 Wcm-2, an impulse desorption of ions was obsd. from adsorbed gaseous layers or deposited org. mols. Desorbed ions were selected and detected by means of a time-of-flight mass analyzer. The phys. mechanisms of desorption are discussed. [on SciFinder (R)]

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