SU-8 nanocomposite photoresist with low stress properties for microfabrication applications
2006
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Details
Title
SU-8 nanocomposite photoresist with low stress properties for microfabrication applications
Author(s)
Jiguet, Sébastien ; Bertsch, Arnaud ; Judelewicz, M. ; Hofmann, H. ; Renaud, Philippe
Published in
Microelectronic engineering
Volume
83
Pages
1966-1970
Date
2006
Other identifier(s)
DAR: 8904
View record in Web of Science
View record in Web of Science
Laboratories
LMIS4
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS4 - Microsystems Laboratory 4
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-10-20