Infoscience

Patent

Manufacture of micro-electro-mechanical-system using sacrificial layer made of silicon, useful for micro-electro-mechanical-system device architecture, e.g. radio-frequency capacitive switch and current switch

NOVELTY - A micro-electro-mechanical-system (MEMS) is manufactured by the use of a sacrificial layer that is made of silicon. USE - The invention is used in surface micromachining for the manufacture of a MEMS containing a suspended metal layer or MEMS device architecture. MEMS device is a suspended gate metal oxide semiconductor field effect transistor (SG-MOSFET). It is used as radio-frequency capacitive switch, current switch, radio-frequency tuneable capacitor, magnetic field sensor, accelerometer, and pressure sensor. (all claimed)

Related material