Spectromicroscopy study of lateral band bending of the Ge-GaSe heterostructure
We report a study of the lateral band bending at the Ge-GaSe interface. Spectromicroscopy measurements with synchrotron radiation were performed at the ESCA microscopy line of ELETTRA in Ge patterned films on GaSe substrates. Preliminary results of lateral band bending, chemical reactions and the beam stimulated Ge surface migration are presented. These studies allowed us to seek on the microscopical equivalent of the semiconductor Debye length and to probe the capabilities of scanning-focused spectromicroscopical systems.
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Sincrotrone trieste,i-34012 trieste,italy. Almeida, J, ECOLE POLYTECH FED LAUSANNE,INST PHYS APPL,CH-1015 LAUSANNE,SWITZERLAND.
ISI Document Delivery No.: WC413
Record created on 2006-10-03, modified on 2016-08-08