Journal article

Scanning Photoemission Microscopy on Maximum Reaches 0.1 Micron Resolution

We present the first results from the upgraded version of the scanning photoemission spectromicroscope MAXIMUM, bared on synchrotron undulator fight and on a multilayer-coated Schwarzschild objective. The upgrade involved nearly all parts of the instrument, notably the beamline and the electron analysis system. Micro-images of Fresnel zone plates and of metal test patterns on semiconductor substrates reached a new record in lateral resolution, well beyond 0.1 micron. The first spectromicroscopy tests were also successfully performed on the new instrument, with analysis of f and d core levels in different systems.


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