Scanning Photoemission Microscopy on Maximum Reaches 0.1 Micron Resolution

We present the first results from the upgraded version of the scanning photoemission spectromicroscope MAXIMUM, bared on synchrotron undulator fight and on a multilayer-coated Schwarzschild objective. The upgrade involved nearly all parts of the instrument, notably the beamline and the electron analysis system. Micro-images of Fresnel zone plates and of metal test patterns on semiconductor substrates reached a new record in lateral resolution, well beyond 0.1 micron. The first spectromicroscopy tests were also successfully performed on the new instrument, with analysis of f and d core levels in different systems.


Published in:
Surface Science, 287, 1046-1050
Year:
1993
ISSN:
0039-6028
Keywords:
Note:
Lawrence berkeley lab,berkeley,ca 94720. cnr,ist struttura mat,frascati,italy. ecole polytech fed lausanne,inst phys appl,ch-1015 lausanne,switzerland. Capasso, c, univ wisconsin,ctr xray lithog,stoughton,wi 53589.
ISI Document Delivery No.: LF071
Part B
Laboratories:




 Record created 2006-10-03, last modified 2018-03-18


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