Schottky Barrier Formation by Silicon Deposition on Unreactive and Reactive Metal Substrates
1989
Details
Title
Schottky Barrier Formation by Silicon Deposition on Unreactive and Reactive Metal Substrates
Author(s)
Chang, Y. ; Hanson, J. ; Hwu, Y. ; Zanini, F. ; Margaritondo, G.
Published in
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Volume
7
Issue
3
Pages
717-719
Date
1989
ISSN
0734-2101
Note
Univ wisconsin,dept phys,madison,wi 53706. univ wisconsin,ctr synchrotron radiat,madison,wi 53706.
ISI Document Delivery No.: U7153
Part 1
ISI Document Delivery No.: U7153
Part 1
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LSE - Laboratory of Photoelectron Spectroscopy
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-10-03