Schottky-Barrier Formation by Silicon Deposition on Unreactive and Reactive Metal Substrates


Published in:
Journal of Vacuum Science & Technology a-Vacuum Surfaces and Films, 7, 3, 717-719
Year:
1989
ISSN:
0734-2101
Note:
Univ wisconsin,dept phys,madison,wi 53706. univ wisconsin,ctr synchrotron radiat,madison,wi 53706.
ISI Document Delivery No.: U7153
Part 1
Laboratories:




 Record created 2006-10-03, last modified 2018-01-27


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