Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface
1984
Details
Title
Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface
Author(s)
Richter, H. ; Orlowski, T. E. ; Kelly, M. ; Margaritondo, G.
Published in
Journal of Applied Physics
Volume
56
Issue
8
Pages
2351-2355
Date
1984
ISSN
0021-8979
Note
Univ wisconsin,dept phys,madison,wi 53706. Richter, h, xerox corp,webster res ctr,rochester,ny 14644.
ISI Document Delivery No.: TL568
ISI Document Delivery No.: TL568
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LSE - Laboratory of Photoelectron Spectroscopy
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-10-03