Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface


Published in:
Journal of Applied Physics, 56, 8, 2351-2355
Year:
1984
ISSN:
0021-8979
Note:
Univ wisconsin,dept phys,madison,wi 53706. Richter, h, xerox corp,webster res ctr,rochester,ny 14644.
ISI Document Delivery No.: TL568
Laboratories:




 Record created 2006-10-03, last modified 2018-03-18


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