Infoscience

Journal article

Ultrafast Uv-Laser-Induced Oxidation of Silicon - Control and Characterization of the Si-Sio2 Interface

    Note:

    Univ wisconsin,dept phys,madison,wi 53706. Richter, h, xerox corp,webster res ctr,rochester,ny 14644.

    ISI Document Delivery No.: TL568

    Reference

    Record created on 2006-10-03, modified on 2016-08-08

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