Reduction of Silicon-Aluminum Interdiffusion by Improved Semiconductor Surface Ordering
1984
Details
Title
Reduction of Silicon-Aluminum Interdiffusion by Improved Semiconductor Surface Ordering
Author(s)
Brillson, L. J. ; Slade, M. L. ; Katnani, A. D. ; Kelly, M. ; Margaritondo, G.
Published in
Applied Physics Letters
Volume
44
Issue
1
Pages
110-112
Date
1984
ISSN
0003-6951
Note
Univ wisconsin,dept phys,madison,wi 53706. Brillson, lj, xerox corp,webster res ctr,webster,ny 14580.
ISI Document Delivery No.: RZ083
ISI Document Delivery No.: RZ083
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Scientific production and competences > SB - School of Basic Sciences > SB Archives > LSE - Laboratory of Photoelectron Spectroscopy
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > SB - School of Basic Sciences > SB Archives > LPRX - X-Ray Physics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-10-03