Cds-Cu Interface Formation - a Microscopic Study of the Inter-Diffusion and Chemical Processes


Published in:
Journal of Vacuum Science & Technology, 20, 3, 701-704
Year:
1982
ISSN:
0022-5355
Note:
Xerox corp,webster res ctr,rochester,ny 14644. Stoffel, ng, univ wisconsin,dept phys,madison,wi 53706.
ISI Document Delivery No.: NL274
Laboratories:




 Record created 2006-10-03, last modified 2018-03-18


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