Development of relaxor ferroelectric materials for screen-printing on alumina and silicon substrates
2005
Abstract
The paper describes processing and dielectric properties of 0.65Pb(Mn1/3Nb2/3)O-3-0.35PbTiO(3) films deposited on alumina and silicon substrates by screen-printing. Ink development and problems associated with adhesion of electrodes to substrate are discussed in detail. The relative dielectric permittivity, as large as 13,000 have been obtained on SiO2 substrate after processing optimization. (c) 2005 Elsevier Ltd. All rights reserved.
Details
Title
Development of relaxor ferroelectric materials for screen-printing on alumina and silicon substrates
Author(s)
Gentil, S. ; Damjanovic, D. ; Setter, N.
Published in
Journal of the European Ceramic Society
Volume
25
Issue
12
Pages
2125-2128
Date
2005
ISSN
0955-2219
Keywords
Note
Gentil, S Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, Mat Inst, Ceram Lab, CH-1015 Lausanne, Switzerland Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, Mat Inst, Ceram Lab, CH-1015 Lausanne, Switzerland
946JW
Cited References Count:5
946JW
Cited References Count:5
Other identifier(s)
DAR: 7083
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Laboratories
LC
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > LC - Ceramics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-08-21