Development of relaxor ferroelectric materials for screen-printing on alumina and silicon substrates

The paper describes processing and dielectric properties of 0.65Pb(Mn1/3Nb2/3)O-3-0.35PbTiO(3) films deposited on alumina and silicon substrates by screen-printing. Ink development and problems associated with adhesion of electrodes to substrate are discussed in detail. The relative dielectric permittivity, as large as 13,000 have been obtained on SiO2 substrate after processing optimization. (c) 2005 Elsevier Ltd. All rights reserved.


Published in:
Journal of the European Ceramic Society, 25, 12, 2125-2128
Year:
2005
ISSN:
0955-2219
Keywords:
Note:
Gentil, S Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, Mat Inst, Ceram Lab, CH-1015 Lausanne, Switzerland Ecole Polytech Fed Lausanne, Swiss Fed Inst Technol, Mat Inst, Ceram Lab, CH-1015 Lausanne, Switzerland
946JW
Times Cited:0
Cited References Count:5
Other identifiers:
Laboratories:




 Record created 2006-08-21, last modified 2018-03-17


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