Etching of RuO2 and Pt thin films with ECR/RF reactor
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The removal characteristics of blanket films and films with a patterned mask (photoresist or SiO2 masks) were investigated as a function of gas chemistry (Ar, O-2, halogen gases), ion beam energy (ion extraction/acceleration voltages), substrate bias RF power and working pressure (from 5 x 10(-3) to 5 x 10(-1) Pa). The etch processes were characterized in terms of etch rate, selectivity, critical dimension, lateral uniformity and mask stability. High etching rate processes (up to 70 nm/min for RuO2 and 60 nm/min for Pt with removable photoresist mask) were obtained and a micron scale patterns demonstrated. Patterning of a multilayer stack PZT/Pt/SiO2 could be achieved with a single photolithography step. (C) 2000 Elsevier Science Ltd. All rights reserved.
Baborowski, J Ecole Polytech Fed Lausanne, Lab Ceram, Swiss Fed Inst Technol, CH-1015 Lausanne, Switzerland Ecole Polytech Fed Lausanne, Lab Ceram, Swiss Fed Inst Technol, CH-1015 Lausanne, Switzerland
Cited References Count:18
Record created on 2006-08-21, modified on 2016-08-08