A Thin-Film Pyroelectric Detector

A dual element, point, infra-red detector is being developed from a sol-gel deposited PbTiO3 thin-film on a micro-machined silicon substrate. Patterning of the ferroelectric film and the electrodes is accomplished by photolithographic techniques. Membranes to reduce the thermal conduction from the sensor elements are created in the underlying substrate by anisotropic etching of the silicon. The measured voltage responsivity (R(V)) as a function of radiation modulation frequency is compared to theoretical predictions and to conventional pyroelectric detector characteristics. Optimisation of the performance with respect to the device design is discussed.


Published in:
Integrated Ferroelectrics, 6, 1-4, 231-240
Year:
1995
ISSN:
1058-4587
Keywords:
Note:
Bell, A Ecole Polytech Fed Lausanne,Ceram Lab,Ch-1015 Lausanne,Switzerland Eth Zurich,Phys Electr Lab,Zurich,Switzerland Technion Israel Inst Technol,Dept Electr Engn,Haifa,Israel
Qw499
Times Cited:17
Cited References Count:9
Laboratories:




 Record created 2006-08-21, last modified 2018-03-17


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