Mass-Spectrometric Detection of Low-Ppm Contaminants in Sputter Process Systems at 10-2 Mbar, Using a Directly Exposed Ion-Source

Trace contaminants in sputter atmospheres (10(-2) mbar Ar) are determined with a mass spectrometer whose ionizer is directly exposed to the process pressure, whereas the quadrupole filter is kept at high vacuum. The background limitations inherent to conventional differentially pumped analyzers are overcome. Detection limits are 1 ppm for H2O and few ppb for other species.


Publié dans:
Vacuum, 41, 7-9, 2106-2108
Année
1990
ISSN:
0042-207X
Note:
Koprio, J Balzers Ag,Fl-9496 Balzers,Liechtenstein
Ev616
Times Cited:3
Cited References Count:3
Laboratoires:




 Notice créée le 2006-08-21, modifiée le 2018-03-17


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