Hard and soft landing of mass selected Ag clusters on Pt(111)
Mass selected Ag/sub n/ clusters (n=1,7,19) from a secondary ion source have been deposited onto a Pt(111) substrate at low temperature. The surface and resulting cluster morphology have subsequently been characterized within the same UHV chamber by variable temperature STM as a function of cluster size, kinetic impact energy, and substrate temperature. The kinetic energy per cluster atom was found to be the decisive parameter for a controlled deposition. Noble gas buffer layers ( approximately=10 ML Ar), which were pre-adsorbed onto the surface at low temperatures, were found to efficiently dissipate the impact energy opening up the possibility of soft landing clusters with elevated kinetic energy.
Keywords: adsorbed layers; argon ; discontinuous metallic thin films; ion surface impact; ionised cluster beam deposition; metal clusters; platinum ; scanning tunnelling microscopy; silver ; surface structure hard landing; soft landing; mass selected Ag clusters; Pt111 ; Pt111 substrate; surface ; cluster morphology; variable temperature STM; cluster size; kinetic impact energy; substrate temperature; kinetic energy; controlled deposition; noble gas buffer layers; Ar ; pre adsorbed surface; impact energy; soft landing clusters; elevated kinetic energy; Ag ; Pt A7920N (Atom molecule and ion surface impact); A6820 (Solid surface structure); A6855 (Thin film growth structure and epitaxy); A8115J (Ion plating and other vapour deposition); A6845B (Sorption equilibrium at solid fluid interfaces); A6146 (Solid clusters including fullerenes and nanoparticles); A79; A68; A81; A61; A7; A6 ; Nucleation ; Aggregation ; Self-Assembly ; Epitaxial Growth
Record created on 2006-07-25, modified on 2016-08-08