STAMP FABRICATION FOR NANOIMPRINT LITHOGRAPHY BY PATTERN DEFINITION WITH STENCIL LITHOGRAPHY

A silicon stamp for nanoimprint lithography (NIL) was fabricated from the patterns defined by stencil lithography. Since stencil lithography has a capability of producing sub-micron patterns in a single process, we were able to make a silicon stamp with a very simple procedure consisting of only 4 steps. A series of experiments showed that about 200 nm of “defect” structures were well transferred from the stencil to the pattern on silicon stamp for NIL process, which replicates the structures into a silicon substrate by NIL followed by dry etching processes. The presented procedure has a potential to be applied to nanoscale stamp fabrication process.


Year:
2006
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2006-03-20, last modified 2018-03-17

n/a:
Download fulltext
PDF

Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)