REVERSE TRANSFER OF NANOSTENCIL PATTERNS USING INTERMEDIATE SACRIFICIAL LAYER AND LIFT-OFF
We have developed a new process for reversing the nanostencil patterns by using an intermediate sacrificial layer. Using this process, we can pattern isolated ‘empty’ shapes with their background filled with a certain material, which is impossible with the normal stencil technique. By combining the reverse and normal patterning process properly, we can utilize the nanostencil technology as a more powerful tool for forming various types of micro- and nano-structures.
Record created on 2006-03-20, modified on 2016-08-08