REVERSE TRANSFER OF NANOSTENCIL PATTERNS USING INTERMEDIATE SACRIFICIAL LAYER AND LIFT-OFF

We have developed a new process for reversing the nanostencil patterns by using an intermediate sacrificial layer. Using this process, we can pattern isolated ‘empty’ shapes with their background filled with a certain material, which is impossible with the normal stencil technique. By combining the reverse and normal patterning process properly, we can utilize the nanostencil technology as a more powerful tool for forming various types of micro- and nano-structures.


Year:
2006
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Note: The status of this file is: EPFL only


 Record created 2006-03-20, last modified 2018-03-17

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