FABRICATION OF ULTRA SENSITIVE MONOCRYSTALLINE SILICON CANTILEVERS

The goal of the project is to fabricate ultra sensitive cantilevers for magnetic resonance force microscopy. Such devices have been produced using SOI wafers and a novel fabrication process combining Al encapsulation and HF-vapor release. The realized cantilevers are 200, 350 or 500 µm long, 10 or 20 µm wide and 500 or 340 nm thick. The characterization shows promising results in vacuum at room temperature, e.g. a cantilever annealed at 800°C (L=500um, w=10um, t=0.5um) has a resonance frequency f = 2kHz, a spring constant k = 0.0004 N/m and a quality factor Q > 100000.


Année
2006
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Note: Le statut de ce fichier est: Seulement EPFL


 Notice créée le 2006-03-20, modifiée le 2018-03-17

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