Novel apparatus for the uniform heating of substrates during post-expose bake
2003
Details
Title
Novel apparatus for the uniform heating of substrates during post-expose bake
Author(s)
Hillman, Gary ; Infelta, Pierre
Published in
Advances in Resist Technology and Processing XX
Series
Proceedings of SPIE-The International Society for Optical Engineering, 5039
Volume
2
Pages
1319-1326
Date
2003
Laboratories
LPI
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > ISIC - Institute of Chemical Sciences and Engineering > LPI - Laboratory of Photonics and Interfaces
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2006-02-21