000079509 001__ 79509
000079509 005__ 20180317093102.0
000079509 0247_ $$2doi$$a10.1002/1521-3862(200008)6:4<193::AID-CVDE193>3.0.CO;2-Q
000079509 02470 $$2ISI$$a000088725200006
000079509 037__ $$aARTICLE
000079509 245__ $$aMOCVD of thin ruthenium oxide films: properties and growth kinetics
000079509 269__ $$a2000
000079509 260__ $$c2000
000079509 336__ $$aJournal Articles
000079509 700__ $$aHones, Peter
000079509 700__ $$0241655$$aLevy, Francis$$g105661
000079509 700__ $$aGerfin, Tobias
000079509 700__ $$0240191$$aGratzel, Michael$$g105292
000079509 773__ $$j6$$k4$$q193-198$$tChemical Vapor Deposition
000079509 909CO $$ooai:infoscience.tind.io:79509$$particle$$pSB
000079509 909C0 $$0252060$$pLPI$$xU10101
000079509 937__ $$aLPI-ARTICLE-2000-020
000079509 970__ $$a543/LPI
000079509 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000079509 980__ $$aARTICLE