MOCVD of thin ruthenium oxide films: properties and growth kinetics
2000
Details
Title
MOCVD of thin ruthenium oxide films: properties and growth kinetics
Author(s)
Hones, Peter ; Levy, Francis ; Gerfin, Tobias ; Gratzel, Michael
Published in
Chemical Vapor Deposition
Volume
6
Issue
4
Pages
193-198
Date
2000
Other identifier(s)
View record in Web of Science
Laboratories
LPI
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > ISIC - Institute of Chemical Sciences and Engineering > LPI - Laboratory of Photonics and Interfaces
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2006-02-21