Study of a mechanically clamped cryo-chuck device in a high density plasma for deep anisotropic etching of silicon
2001
Details
Title
Study of a mechanically clamped cryo-chuck device in a high density plasma for deep anisotropic etching of silicon
Author(s)
Hibert, C. ; Aachboun, S. ; Boufnichel, M. ; Ranson, P.
Published in
Journal of Vacuum Science & Technology A
Volume
19
Issue
2
Pages
646-650
Date
2001
Laboratories
CMI
Record Appears in
Scientific production and competences > STI - School of Engineering > CMI - Center of MicroNanoTechnology
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2005-11-11