000053987 001__ 53987
000053987 005__ 20180317093124.0
000053987 0247_ $$2doi$$a10.1088/0960-1317/7/3/010
000053987 02470 $$2ISI$$aA1997YA66200010
000053987 037__ $$aARTICLE
000053987 245__ $$aSU-8: a low-cost negative resist for MEMS
000053987 269__ $$a1997
000053987 260__ $$c1997
000053987 336__ $$aJournal Articles
000053987 520__ $$aThis paper describes the characterization of a home-made negative photoresist    developed by IBM. This resist, called SU-8, can be produced with commercially    available materials. Three blends were prepared for this article and some of its    optical and mechanical properties are presented. One of its numerous    advantages is the broad range of thicknesses which can be obtained in one spin:    from 750 nm to 450 mu m with a conventional spin coater. The resist is    exposed with a standard UV aligner and has an outstanding aspect ratio near 15    for lines and 10 for trenches. These ratios combined with the electroplating of    copper allow the fabrication of highly integrated electromagnetic coils.
000053987 700__ $$aLorenz, Hubert
000053987 700__ $$aDespont, M.
000053987 700__ $$aFahrni, N.
000053987 700__ $$aLaBianca, N.
000053987 700__ $$0240219$$aRenaud, Philippe$$g107144
000053987 700__ $$aVettiger, P.
000053987 773__ $$j7$$k3$$q121-124$$tJOURNAL OF MICROMECHANICS AND MICROENGINEERING
000053987 8564_ $$zURL
000053987 8564_ $$s652170$$uhttps://infoscience.epfl.ch/record/53987/files/Lorenz_JMM7_1997_SU8.pdf$$zn/a
000053987 909CO $$ooai:infoscience.tind.io:53987$$particle$$pSTI
000053987 909C0 $$0252064$$pLMIS4$$xU10324
000053987 937__ $$aLMIS4-ARTICLE-1997-001
000053987 970__ $$aISI:A1997YA66200010/LMIS4
000053987 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000053987 980__ $$aARTICLE