Déposition assistée par un plasma à arc à haut courant continu de couches minces de nitrure de bore et de silicium microcristallin hydrogéné
1999
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Title
Déposition assistée par un plasma à arc à haut courant continu de couches minces de nitrure de bore et de silicium microcristallin hydrogéné
Author(s)
Franz, David
Advisor(s)
Pagination
177
Date
1999
Publisher
Lausanne, EPFL
Language
French
Laboratories
CRPP
SPC
SPC
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Scientific production and competences > EPFL Theses
Work produced at EPFL
Published
Theses
Scientific production and competences > EPFL Theses
Work produced at EPFL
Published
Theses
Record creation date
2005-03-16