A method for quantitative nanoscale imaging of dopant distributions using secondary ion mass spectrometry: an application example in silicon photovoltaics

A method for rapid quantitative imaging of dopant distribution using secondary ion mass spectrometry (SIMS) is described. The method is based on SIMS imaging of the cross-section of a reference sample with a known concentration profile. It is demonstrated for the case of boron quantification in silicon in a SIMS imaging mode. A nonlinear relationship between the secondary ion intensity and the concentration is observed. A detection limit of 3 (+/- 2) x 10(17) at./cm(3) (similar to 6 ppm) is determined with 39 nm pixel-size for the used experimental conditions. As an application example, a boron concentration profile in a passivating contact deposited on a textured Si surface is analyzed.


Published in:
Mrs Communications, 9, 3, 916-923
Year:
Sep 01 2019
Publisher:
New York, CAMBRIDGE UNIV PRESS
ISSN:
2159-6859
2159-6867
Keywords:




 Record created 2019-10-17, last modified 2019-12-05


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