A large variety of physical analysis techniques are used in the semiconductor industry to identify defects impacting yield or reliability. Identification of a defect often requires the combined use of several techniques to give a clear understanding of th
Title
Identification of amorphous silicon residues in a low power CMOS technology
Published in
Proceedings of SPIE
Volume
3884
Pages
256-264
Conference
in-line methods and monitors for process and yield improvement, 1999
Date
1999
Publisher
SPIE
ISBN
0-8194-3481-7
Record creation date
2019-07-04