Identification of amorphous silicon residues in a low power CMOS technology

A large variety of physical analysis techniques are used in the semiconductor industry to identify defects impacting yield or reliability. Identification of a defect often requires the combined use of several techniques to give a clear understanding of th


Editor(s):
Ajuria, S
Jakubczak, JF
Published in:
Proceedings of SPIE, 3884, 256-264
Presented at:
in-line methods and monitors for process and yield improvement, 1999
Year:
1999
Publisher:
SPIE
ISBN:
0-8194-3481-7
Laboratories:




 Record created 2019-07-04, last modified 2020-06-08


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