000267909 001__ 267909
000267909 005__ 20190812204805.0
000267909 020__ $$a0-306-43362-1
000267909 037__ $$aCONF
000267909 245__ $$atransmission and reflection electron-microscopy on cleaved edges of iii-v-multilayered structures
000267909 260__ $$bNATO$$c1989
000267909 269__ $$a1989
000267909 336__ $$aConference Papers
000267909 700__ $$aBuffat, PA
000267909 700__ $$aGANIERE, JD
000267909 700__ $$aSTADELMANN, P
000267909 7112_ $$aevaluation of advanced semiconductor materials by electron microscopy$$d1989
000267909 720__ $$aCherns, D
000267909 773__ $$tNATO ADVANCED SCIENCE INSTITUTES SERIES, SERIES B, PHYSICS
000267909 909C0 $$0252025$$pCIME$$xU10192$$zBorel, Alain$$mcecile.hebert@epfl.ch
000267909 909CO $$pconf$$pSB$$ooai:infoscience.epfl.ch:267909
000267909 961__ $$amanon.velasco@epfl.ch
000267909 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000267909 980__ $$aCONF