000266399 001__ 266399
000266399 005__ 20190708214541.0
000266399 022__ $$a2475-9953
000266399 02470 $$a000467746600003$$2isi
000266399 0247_ $$a10.1103/PhysRevMaterials.3.053802$$2doi
000266399 037__ $$aARTICLE
000266399 245__ $$aLocal tuning of fused silica thermal expansion coefficient using femtosecond laser
000266399 260__ $$c2019$$aCollege Pk$$bAMER PHYSICAL SOC
000266399 269__ $$a2019-05-10
000266399 336__ $$aJournal Articles
000266399 520__ $$aFemtosecond laser exposure of fused silica in the nonablative regime can lead to various localized bulk modifications of the material structure. In this paper, we show that these laser-induced modifications can be used to tune silica thermal expansion properties permanently. In particular, we demonstrate that a given exposer regime leads to lower thermal expansion than the bulk, while other exposure conditions yield the opposite results. This remarkable property enables the possibility to engineer a given thermal expansion behavior by selectively exposing a material volume to a femtosecond laser beam. This finding opens up opportunities for a variety of integrated precision instruments and optical devices for which inertness to thermal fluctuations is essential.
000266399 650__ $$aMaterials Science, Multidisciplinary
000266399 650__ $$aMaterials Science
000266399 6531_ $$aoptical wave-guides
000266399 6531_ $$amechanical-properties
000266399 6531_ $$aelastic-moduli
000266399 6531_ $$awritten
000266399 6531_ $$aintegration
000266399 6531_ $$aglass
000266399 6531_ $$amicromechanics
000266399 6531_ $$abirefringence
000266399 6531_ $$adependence
000266399 700__ $$aVlugter, Pieter$$0250310$$g255380
000266399 700__ $$aBlock, Erica$$0250049$$g269874
000266399 700__ $$aBellouard, Yves$$0248800$$g109297
000266399 773__ $$q053802$$k5$$j3$$tPhysical Review Materials
000266399 8560_ $$fyves.bellouard@epfl.ch
000266399 909C0 $$zMarselli, Béatrice$$0252537$$yApproved$$pGALATEA$$xU13016$$myves.bellouard@epfl.ch
000266399 909CO $$particle$$ooai:infoscience.epfl.ch:266399$$pSTI
000266399 961__ $$amanon.velasco@epfl.ch
000266399 973__ $$aEPFL$$sPUBLISHED$$rREVIEWED
000266399 980__ $$aARTICLE
000266399 980__ $$aWoS
000266399 981__ $$aoverwrite