000263795 001__ 263795
000263795 005__ 20190316233221.0
000263795 0247_ $$2doi$$a10.1117/12.2297171
000263795 02470 $$a10.1117/12.2297171$$2DOI
000263795 037__ $$aARTICLE
000263795 245__ $$aEnabling proximity mask-aligner lithography with a 193nm CW light source
000263795 260__ $$c2018-03-20
000263795 269__ $$a2018-03-20
000263795 336__ $$aJournal Articles
000263795 520__ $$aWe introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-amplification configuraton is frequency-quadrupled using lithiumtriborate and potassium-fluoro-beryllo-borate non-linear crystals. The large coherence-length of this monomodal laser is controlled by static and rotating shaped random diffusers. Beam shaping with imaging and non-imaging homogenizers realized with diffractive and refractive micro-optical elements is compared in simulation and measurement. We demonstrate resolution patterns offering resolutions <2 µm printed with proximity gaps of 20 µm.
000263795 6531_ $$aNanophotonics
000263795 6531_ $$aPlasmonics
000263795 700__ $$aOwa, Soichi
000263795 700__ $$aKye, Jongwook
000263795 700__ $$aScholz, Matthias
000263795 700__ $$aOpalevs, Dmitrijs
000263795 700__ $$aVetter, Andreas
000263795 700__ $$aKirner, Raoul
000263795 700__ $$aVoelkel, Reinhard
000263795 700__ $$aRockstuhl, Carsten
000263795 700__ $$aNoell, Wilfried
000263795 700__ $$aScharf, Toralf
000263795 700__ $$aLeisching, Patrick
000263795 773__ $$tPROCEEDINGS OF SPIE$$j10587$$q50
000263795 8560_ $$fbeatrice.raball@epfl.ch
000263795 8564_ $$uhttps://infoscience.epfl.ch/record/263795/files/Enabling%20proximity%20mask-aligner%20lithography%20with%20a%20193nm%20CW%20light%20source.pdf$$s918637
000263795 909C0 $$xU10373$$pNAM$$molivier.martin@epfl.ch$$zMarselli, Béatrice$$0252353
000263795 909CO $$qGLOBAL_SET$$pSTI$$particle$$ooai:infoscience.epfl.ch:263795
000263795 960__ $$abeatrice.raball@epfl.ch
000263795 961__ $$afantin.reichler@epfl.ch
000263795 973__ $$aEPFL$$sPUBLISHED$$rREVIEWED
000263795 980__ $$aARTICLE
000263795 981__ $$aoverwrite