We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-ampliﬁcation conﬁguraton is frequency-quadrupled using lithiumtriborate and potassium-ﬂuoro-beryllo-borate non-linear crystals. The large coherence-length of this monomodal laser is controlled by static and rotating shaped random diﬀusers. Beam shaping with imaging and non-imaging homogenizers realized with diﬀractive and refractive micro-optical elements is compared in simulation and measurement. We demonstrate resolution patterns oﬀering resolutions <2 µm printed with proximity gaps of 20 µm.